Nanometrics introduces Lynx metrology system

Jul 16, 2008 (Datamonitor via COMTEX) -- NANO | Quote | Chart | News | PowerRating -- Nanometrics, a supplier of process control metrology equipment, has introduced the LynxTM metrology platform.

The company claims that the Lynx is a compact 300mm cluster metrology platform to enable thin film, optical critical dimension (OCD) and overlay measurements in a single system.

The Lynx's versatility provides for a range of custom configurations, from a streamlined single metrology platform to an expanded, high-productivity, multi-metrology platform. Modules can be easily installed or upgraded to extend system capabilities.

Productivity of the Lynx system is optimized by Nanometrics' proprietary cluster control software, which allows for sequence and recipe customization in a high-volume production environment. The Lynx's compact and versatile cluster architecture provides a significant cost of ownership improvement, with a 30% smaller footprint in the fab, a 30% reduction in tool-to-tool wafer transportation and a 50% reduction in installation and facilities costs.

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