KLA-Tencor Offers Lithography Tool for Double-Patterning Challenges

Jul 16, 2008 (M2 PRESSWIRE via COMTEX) -- KLAC | Quote | Chart | News | PowerRating -- KLA-Tencor has introduced the latest version of its computational lithography tool, Prolith 11.

The company said that the new tool enables users for the first time to evaluate current double-patterning schemes and cost-effectively explore alternate solutions to lithography challenges in design, materials and process development. This new computational lithography tool also supports single-pass patterning and immersion technologies.

"The emergence of double-patterning lithography has challenged circuit designers and chipmakers because of the dramatic increase in lithography complexity and experimental costs," said Ed Charrier, vice president and general manager of KLA-Tencor's Process Control Information Division. "Computational lithography has become an essential tool for controlling these costs. Among computational lithography tools, Prolith 11 has the unique ability to allow engineers to explore wide ranges of design, material or process conditions in order to solve a particular problem - without having to spend the resources of a fab."

Double-patterning lithography (DPL) is a method for constructing the small features of advanced devices by dividing the pattern into two interleaved patterns. This means that a double mask set and new photoresist materials are required for DPL layers, amplifying process complexity and cost. With experts predicting the price of a mask set to exceed $4M at the 32nm node, fabs are strongly motivated to thoroughly characterize how a two-pass, double-mask, dual-resist strategy will print on the wafer under the natural range of process conditions, so that the mask designs, materials and process parameters are right the first time.

KLA-Tencor said its Prolith 11 allows engineers to model this complex system with precision, and then use the model to optimize the system by exploring the effects of small or large changes in mask design, photoresist properties, and scanner or process parameters on the printed pattern. By using Prolith 11, fabs avoid time-consuming, expensive experiments on product wafers which delay time to market and result in thousands of scrapped processed wafers.

As one tool in a complete suite of systems from KLA-Tencor designed to address advanced lithography challenges, Prolith 11 has been shipped to chipmakers in the U.S., Japan and Taiwan. The Prolith platform comprises the most widely used lithography simulation toolset on the market, installed in the development groups of virtually every chipmaker currently producing 65nm and 45nm devices, according to KLA-Tencor.

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