Olympus Integrated Technologies America Delivers IR Inspection and Measurement System to SEMATECH for 3D-TSV Interconnect Program at UAlbany NanoCollege

The SEMATECH 3D interconnect process using TSVs requires bonding the active side of processed wafers together. Once the wafers are bonded there is an immediate need to verify the accuracy of the bonding alignment, but the active wafer surfaces containing the alignment targets are no longer visible. The Olympus IR Inspection System allows observation and image acquisition of the alignment targets and vias by "seeing" through the 775um thick silicon wafer to the patterned surfaces. Overlaid alignment marks are imaged and measured to verify bonding alignment accuracy. Alignment is critical for the device to function optimally. The Olympus tool was installed and accepted in April, 2009.

"Precise alignment is one of the major challenges affecting the performance of the 3D interconnects," said Sitaram Arkalgud, SEMATECH's director of 3D Interconnect. "Wafer bonding is a key process, and Olympus' defect review system provides precise imaging technology that allows our researchers to address the technical challenges related to bonding interface defectivity and overlay metrology."

"We have been collaborating with SEMATECH on inspection and defect review tools since 2001 and working with the 3D group since last year to provide a method to image and measure overlay offsets after wafers have been bonded together," said Olympus-ITA president Greg Baker. "Olympus' IR inspection and defect review tool with metrology functionality is now in operation at SEMATECH's 3D R&D Center and is proving to provide very clear images and accurate measurements to help ensure via alignment and interconnectivity."

"The SEMATECH-CNSE partnership continues to enable innovative process solutions for the manufacturing of advanced nanoscale devices," said Richard Brilla, CNSE vice president for Strategy, Alliances and Consortia. "The addition of the Olympus IR inspection and defect review system will support that effort, while further enhancing the world-class technological capabilities of CNSE's Albany NanoTech Complex for the benefit of our global corporate partners and the nanoelectronics industry."

Olympus-ITA will be participating in the SEMATECH Workshop on 3D Interconnect Metrology, being held on July 15, 2009 at the San Francisco Marriott in San Francisco, CA. Richard Poplawski, on-site project manager for Olympus-ITA, will give a presentation titled 3D Interconnect Bonded Wafer Pair Metrology Using IR Microscopy. The purpose of the workshop is to gain a better understanding of how new and existing wafer metrology technologies can be utilized, modified, or enhanced to measure and improve 3D interconnect processes.

Visit Olympus-ITA at SEMICON West Booth #1125

Photo of image taken with Olympus IR system, courtesy of SEMATECH available at www.olympus-ita.com/images/SEMATECH_3D_200907.jpg

About Olympus-Integrated Technologies of America

Olympus Integrated Technologies America, Inc. (Olympus-ITA) is a wholly owned subsidiary of the Olympus Corporation of the Americas. Olympus-ITA specializes in semiconductor products and systems for wafer inspection and defect review and is on the forefront of technology with its new IR inspection system for 3D interconnect. Its location in San Jose, California, enables the company to respond quickly to provide sales, service, and support to semiconductor companies throughout the United States. For more information contact Greg Baker at 408-514-3918, email gbaker@olympus-ita.com, or visit our website at www.olympus-ita.com.

About SEMATECH

For 20 years, SEMATECH(R) (www.sematech.org) has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

About CNSE

The UAlbany CNSE is the first college in the world dedicated to education, research, development, and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience, and nanoeconomics. CNSE's Albany NanoTech Complex is the most advanced research enterprise of its kind at any university in the world. With over $5 billion in high-tech investments, the 800,000-square-foot complex attracts corporate partners from around the world and offers students a one-of-a-kind academic experience. The UAlbany NanoCollege houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 80,000 square feet of Class 1 capable cleanrooms. More than 2,500 scientists, researchers, engineers, students, and faculty work on site at CNSE's Albany NanoTech, from companies including IBM, AMD, GlobalFoundries, SEMATECH, Toshiba, Applied Materials, Tokyo Electron, ASML, Vistec Lithography and Atotech. For more information, visit www.cnse.albany.edu.

SOURCE: Olympus Integrated Technologies America, Inc.

Olympus Integrated Technologies America, Inc. 
Greg Baker, 408-514-3918 
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gbaker@olympus-ita.com 
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